Re: IBM - New SUB-Nanometer STACKED Chip

On Tue, 7 Jul 2026 01:21:18 -0000 (UTC), Lawrence D’Oliveiro wrote:

> On Sun, 28 Jun 2026 18:09:44 GMT, Charlie Gibbs wrote:
> 
>> Dunno - but I do remember that manufacturers hit a wall for a while
>> when trying to get below 1 micrometer.
> 
> Part of the way past the barrier was, shall we say, redefining the
> problem.

Photolithography was one limit. State of the art now is extreme 
untraviolet lithography with a 13.5 nm wavelength. ASML in the Netherlands 
is the sole source although you can bet the Chinese are working overtime.

Next stop is x-rays. It has been done on an experimental basis but is even 
more costly.