Re: TAF vs. fine-grained masking

"Calin A. Culianu" <[email protected]>
Newsgroups gmane.linux.dazuko.devel
Message-ID <[email protected]>

On Wed, 30 Mar 2005, John Ogness wrote:

>
>
> Fine-grained masking will take more time than I originally thought, mainly 
> because I want to do a "complete" implementation with individual mask removal 
> included. This means that I will not include it in the 2.1.x series, but will 
> plan it for the 2.2.x series. The main motivation for this decision is that 
> 2.1.0-pre3 already includes many improvements over 2.0.6 and I want to get a 
> stable release of it finished soon. Fine-grained masking will involve many 
> fundamental changes in Dazuko (the underlying implementation as well as API 
> extension) and we are too close to a 2.1.0 release to start digging up the 
> code.
>

Hi John,

Aww no fine-grained masking later this afternoon?  :P It's ok, I figured 
it must be a pretty big change..

I am pretty happy with the improvements in 2.1 already -- I am really 
happy with the fact that include/exclude masks are now per-group.. it 
gives me piece of mind that no other apps will stomp on my app's 
settings.. :)

No worries and thanks for the good work on Dazuko in general!

-Calin
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