Re: TAF vs. fine-grained masking
"Calin A. Culianu" <[email protected]>
| Newsgroups | gmane.linux.dazuko.devel |
|---|---|
| Message-ID | <[email protected]> |
On Wed, 30 Mar 2005, John Ogness wrote: > > > Fine-grained masking will take more time than I originally thought, mainly > because I want to do a "complete" implementation with individual mask removal > included. This means that I will not include it in the 2.1.x series, but will > plan it for the 2.2.x series. The main motivation for this decision is that > 2.1.0-pre3 already includes many improvements over 2.0.6 and I want to get a > stable release of it finished soon. Fine-grained masking will involve many > fundamental changes in Dazuko (the underlying implementation as well as API > extension) and we are too close to a 2.1.0 release to start digging up the > code. > Hi John, Aww no fine-grained masking later this afternoon? :P It's ok, I figured it must be a pretty big change.. I am pretty happy with the improvements in 2.1 already -- I am really happy with the fact that include/exclude masks are now per-group.. it gives me piece of mind that no other apps will stomp on my app's settings.. :) No worries and thanks for the good work on Dazuko in general! -Calin